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Brand Name : Hoan
Delivery Time : 5-7 working days for stock, 3-4 weeks for production
Payment Terms : L/C,D/A,D/P,T/T
CTE Match : Silicon 2.6 ppm/°C, matched to GaN/SiC power substrates
Mounting Type : Wire Bondable / AuSn Eutectic / Solder / Conductive Epoxy
Place of Origin : Shaanxi, China
Chip Dimensions : 0.55 × 0.55 × 0.18 mm (±25 µm); custom geometry up to 4:1 aspect ratio
Operating / Storage Temperature : -55°C to +200°C / -65°C to +150°C
Model Number : HACC221S100V502
Metallization : TiW-Au top (≥2.5 µm Au) / TiW-Pt-Au backside (Au-only available)
MOQ : 10 Pieces
Certification : ISO 9001:2015, RoHS
Capacitance Matching : Sub-1% matched sets across wafer / wafer-to-wafer (digital wafer map)
The HACC221S100V502 is a 220 pF ±10% single-layer MOS (metal-oxide-semiconductor) capacitor rated at 100 V DC, fabricated on float-zone silicon (>1000 Ω·cm) with 300 nm-class thermal SiO2 dielectric and TiW-Au / TiW-Pt-Au metallization. Standard chip outline is 0.55 mm × 0.55 mm × 0.18 mm (±25 µm). It is engineered for wide-bandgap power modules where pair-to-pair capacitance symmetry and thermo-mechanical reliability under power cycling determine circuit performance.
Because the silicon MOS structure is formed directly on a single-crystal silicon substrate, its coefficient of thermal expansion (CTE, 2.6 ppm/°C) is inherently close to that of silicon-carbide and GaN-on-SiC power devices — an advantage over alumina-based ceramic capacitors when co-packaged on power substrates.
| Nominal Capacitance | 220 pF ±10% (1 kHz, 1.0 Vrms); matched sets with <1% spread available |
| Rated Voltage | 100 V DC |
| Dielectric Withstanding Voltage | 250 V DC (250% rated, 5 s, 100% tested) |
| Temperature Coefficient (TCC) | +35 ppm/°C over -55°C to +200°C |
| Dissipation Factor | ≤0.15% at 1 kHz, 1.0 Vrms |
| Q Factor | >2000 at 1 MHz; >200 at 1 GHz |
| ESR at 1 GHz | <0.1 Ω |
| Intrinsic Chip ESL | <0.05 nH (de-embedded); chip-level SRF >1.5 GHz; system SRF >500 MHz with 0.5 mm Au bond wire |
| Leakage Current | <10 nA at 25°C; <500 nA at 200°C (at rated voltage) |
| Insulation Resistance | ≥104 MΩ at rated voltage, 25°C |
| ESD Tolerance | >2 kV HBM, Class 2 per JESD22-A114 |
| Operating / Storage Temperature | -55°C to +200°C / -65°C to +150°C |
| Standard Die Size | 0.55 × 0.55 × 0.18 mm (±25 µm); custom geometry, aspect ratio up to 4:1 |
| Metallization | TiW-Au top (≥2.5 µm Au, wire bondable); TiW-Pt-Au backside (AuSn / solder / silver epoxy) or Au-only backside |
Gate drive and snubber decoupling in GaN and SiC power modules; hybrid power modules and traction inverters; on-board chargers and high-density DC-DC converters; RF power amplifier bias networks; and any co-packaged power assembly where CTE match, matched capacitance and low inductance are required.

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Sub-1% Capacitance Matched MOS Capacitor 220pF 100V CTE Optimized Single Layer Chip For GaN SiC Power Modules Images |